Used SEMITOOL Raider 312 #9240237 for sale

SEMITOOL Raider 312
Manufacturer
SEMITOOL
Model
Raider 312
ID: 9240237
System.
SEMITOOL Raider 312 is an advanced photoresist equipment featuring the latest in high precision lithography technology. The system is designed for a wide range of photolithography applications, including single mask, multiple patterning, and high-resolution imaging. Raider 312 features a three-stage light source ranging from 196nm deep UV to 11,000nm wavelength. The unit utilizes three quartz-halogen light sources to provide maximum exposure range. Additionally, the machine houses several advanced optics, including a precision variable focus optical tool, a zoom optics assembly, and an autofocus asset. These features provide superior imaging accuracy and high resolution capabilities. The worktable on SEMITOOL Raider 312 is designed to accommodate up to 8 substrate wafers of varying sizes and material compositions. The table also features an adjustable height control model for accommodating substrates of various thicknesses and two alignment stages for precise positioning. To ensure uniform illumination across the wafer, the equipment also includes a fixed plane reflector and a reverse field scatter reduction shield. The system features temperature control options as well, allowing for the adjustment of lens temperature to maximize quality. An integrated anti-reflection coating unit also offers maximum flexibility for varied exposures. Raider 312 is designed to handle all photolithography process steps. An integrated wafer handling machine allows automatic substrate loading and alignment; and exposure can be carried out in as quickly as 2.5 seconds. SEMITOOL Raider 312 employs a fully automated, closed-loop calibration procedure; this ensures repeatable performance across all applications. The tool also offers a range of standard software options for user-friendly operation. Additionally, customer service and technical support are available for asset setup and maintenance. In summary, Raider 312 is a high-precision photolithography model featuring advanced optics and temperature control systems for superior imaging accuracy and exposure times. Its fully automated processes and closed-loop calibrations guarantee consistent performance and reliability.
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