Used SEMITOOL Raider ECD 300 #9223828 for sale

SEMITOOL Raider ECD 300 is a photoresist equipment that is employed to apply an opaque, light-sensitive substance to a selected portion of a semiconductor wafer before etching or other further processing. This equipment is specifically designed to provide a greater degree of accuracy and reliability of patterning for photolithography. Raider ECD 300 utilizes electron beam-induced chemical deposition (EBID) technology, which is a variation of chemical vapor deposition (CVD). An electron beam is directed the wafer, creating electrons and ions in the gas around the wafer, which react with the photoresist material and form an opaque blanket over the selected portion of the wafer. This process is capable of detecting and controlling the patterning of the photoresist from 2 um to 500 um pitch, with feature sizes as small as 0.3 um. SEMITOOL Raider ECD 300 is provided with hardware designed to increase operation speed and increase reproducibility and reliability. This includes auto-focus and wafer leveling capability, ensuring that the photoresist pattern is applied efficiently and accurately. The system is also equipped with automated stage rotation for minimum reticle imaging time. Raider ECD 300 has the ability to support various photo resists, from 400 nm to 1000 nm in thickness with high aspect ratio capability. It is also capable of hot and cold single sided resist processing up to 600° C. Additionally, the unit features advanced vacuum technology, enabling reliable resist spin coating, reducing particle emissions, and ensuring prolonged chamber lifetime. SEMITOOL Raider ECD 300's advanced controls and its high-precision sensors enable consistent application of photoresist over the wafer. The tight control over exposure parameters ensures uniform thickness across the wafer surface, and allows for precise control of the critical dimensions of the pattern. Overall, Raider ECD 300 is an ideal tool for semiconductor device fabrication, and is suitable for applications requiring precision patterning at high speed, such as high power device processing, SONOS memory, and microfluidic chips. The machine's advanced features and capabilities make it a reliable and efficient tool for photolithography.