Used SEMITOOL Raider ECD 310 #9236557 for sale

SEMITOOL Raider ECD 310 is a photoresist processing equipment designed for high throughput precision lithography processing. It is capable of processing wafers up to 8 inch in size, with a minimum feature size of 10 microns. The system utilizes a novel electrochemical deposition (ECD) process for the photoresist application. This process has been developed to meet the stringent demands of the semiconductor industry for consistent film profiles, resolution and process repeatability. The ECD 310 employs a combination of proprietary resist technologies and precise electrochemical delivery systems to achieve this. The unit features a fully automated wafer stage, allowing for rapid substrate loading and unloading. This is combined with automated resist dispensing, wafer exposure and washing capabilities for efficient lithography processing. The resist profile is optimised with the use of precision shims and spray heads to ensure uniformity across the wafer and minimize process variability. The machine includes a resist hood and fume extraction capability to ensure containment of hazardous materials. The automated material management functions ensure that the appropriate amount of resist is used in each application, and the correct type is chosen, while the integrated RI detector enables continuous monitoring for real-time feedback and quality control. The tool is network enabled for remote access and monitoring. This allows remote monitoring of process parameters, and the ability to control resist tank levels from an external location. The asset also features high resolution vision model functionality for in-situ wafer inspection, making it possible to analyse defects before and after processing. SEMITOOL RAIDER ECD-310 is a high throughput, precision lithography processing equipment, designed to meet stringent industry standards. It combines automated controls, high precision delivery technologies and vision system functionality to ensure consistent, accurate and repeatable resist application for advanced lithography processing on a variety of substrates.