Used SEMITOOL Raider ECD 310 #9357913 for sale
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ID: 9357913
Wafer Size: 12"
Electroplating system, 12"
Ulpa filtration, P/N: 70006-401
(3) Exhausts
Drip pan
LT Process robot, P/N: 610T0300-01
Station control
User Interface:
Rear, P/N: 650T0030-03
Front, P/N: 650T0030-501
Operating system: Embedded XP system
(2) USB Ports
Metrology unit, P/N: 90005-81
Buffer station, P/N: 640T0377-01
Transfer robot, P/N: 610T0300-01
FOUP / Cassette:
ENTEGRIS F300 Auto pod, P/N: 01-018675
Wafer diameter: 300 ± 0.25 mm
Wafer pitch: Half Pitch
Wafer mapping capability:
E84 Parallel I/O sensors, P/N: 4012-25
E99 Carrier ID reader
(3) HERMOS RF Tag readers
(3) FOUP Load ports, P/N: 640T0147-505
Chemical connections:
Line-1: Catholyte A 180L
Line-2: Anolyte A 65L
Line-5: H2SO4
Line-6: H2O2
Line-7: CDA
Line-8: DI
Line-9: N2
Line-10: House vacuum
Line-11: CO2 Fire suppression
Photospec probe, P/N: 90005-01
pH Probe, P/N: 61326-16
Sampling port, P/N: 429T1635-503
RTA Probe, P/N: 90005-50
Real time analyzer: Gold box
Drain
Chamber 1 and 2:
Rinse dry with bevel etch capability
Lift automation assembly, P/N: 200T0085-03
Mixing tank, P/N: 330T0188-01
Delivery tank, P/N: 330T0190-15
Bowl, P/N: 100T0143-09
Temperature control: Heating / Cooling coils
N2 Dryer
Chamber 3, 4, 5, 6 and 7:
Electroplating chamber with membrane
Automation assembly L/R, P/N: 240T0057-01
Catholyte tank, P/N: 330T0186-515
Anolyte tank, P/N: 330T0243-501
Temperature control: Heating / Cooling coils
Anodes, P/N: 14400-90
Membrane, P/N: 111T1388-03
Filter, P/N: 7004-63
Pump, P/N: 70959-31
De-bubbler, P/N: 119T1289-03
Ring rinse nozzle, P/N: 341T0043-01
Wafer rinse nozzle, P/N: 341T0043-01
Power supply, P/N: 900C0329-01
Chamber 8:
Automation assembly L/R, P/N: 240T0057-01
Catholyte tank, P/N: 330T0186-515
Anolyte tank, P/N: 330T0243-501
Temperature control: Heating / Cooling coils
Anodes, P/N: 14400-90
Membrane, P/N: 111T1388-03
Filter, P/N: 7004-63
Pump, P/N: 70959-31
De-bubbler, P/N: 119T1289-03
De-bubbler, P/N: 119T1289-0
Does no include Hard Disk Drive (HDD).
SEMITOOL Raider ECD 310 is a photoresist equipment designed for the manufacture of photovoltaic cells and other semiconductor devices. It is the latest addition to SEMITOOL Raider family of resist systems, designed to simplify the process of depositing photoresist. SEMITOOL RAIDER ECD-310 provides a reliable, high-performance platform for stenciling of stencil masks with an array of features simplifying the process of stencil mask fabrication. The system features a state-of-the-art robotic spraybed feature that allows the deposition of fluids in a highly controlled and repeatable fashion, covering up to six square feet with a single run. Raider ECD 310's precision, two-axis sprayrobot allows for more accurate stencil placement, minimizing waste and allowing for accurate mask registration. The unit also includes a custom, high-resolution camera that allows for precise mask visualization and easy visualization of process steps. This helps to ensure all process steps are performed with an accuracy of approximately 15μ. The machine makes use of a high-power UV laser that provides the power needed for optimal resist patterning. RAIDER ECD-310 also makes use of a high-vacuum tool to maintain the low temperature required for the deposition of photoresist, as well as to draw out moisture and air contaminants. The asset also incorporates the use of a software package to facilitate setup, repeatability, and maintenance of the sprayrobot parameters. This software simplifies sprayrobot calibration, saving time and reducing the potential for errors. In addition to spraying photoresist, SEMITOOL Raider ECD 310 can also perform chemical wet-etching, enabling the manufacturing of even the most complex photovoltaic devices. SEMITOOL RAIDER ECD-310 is an intuitive and easy-to-use model that provides excellent accuracy, repeatability, and accuracy. Its range of features make it an ideal solution for the production of photovoltaic cells and devices.
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