Used SEMITOOL Raider ECD 310 #9384185 for sale

SEMITOOL Raider ECD 310 is a photoresist strip equipment specifically designed for high-precision processing of large substrates for advanced semiconductor device fabrication and manufacturing. It is equipped with a proprietary dual ion beam source that uses a single module capable of both electron and ion beam delivery. SEMITOOL RAIDER ECD-310 features a patented double-film exposure (DFE) system for optimized pattern definition. The DFE technology utilizes both a "soft" electron beam and a "hard" ion beam to expose a single layer of photoresist. This combination results in an improved pattern definition and reduces the number of operations needed for pattern transfer. The ECD 310 has a field of view (FOV) that covers substrates up to 200 mm in diameter for reticles of up to 12 inches with an accuracy of ± 6 microns. The unit is configurable to be used for either wafer scrubbing or infrared radiation ashing. The machine has an integrated alarm monitoring tool that directs the user to changes in operating parameters. Raider ECD 310 is an efficient, reliable, and user-friendly photoresist processing asset that helps support various complexity and performance requirements in modern semiconductor manufacturing. It features a comprehensive control interface for efficient and accurate processing, with the flexibility to manage both full-scale and semi-scale production runs. Also, it comes with several safety features such as a triple chamber safety encloses, built-in shields, and an independent exhaust. In addition, RAIDER ECD-310 ensures high accuracy of critical process parameters with its automated feature that provides for external control, monitoring, and logging of the in-process OBIR. Overall, this photoresist strip model is designed to help support efficient, reliable, and high-precision processing of substrates.