Used SEMITOOL Raider ECD 310 #9391880 for sale

SEMITOOL Raider ECD 310 is an automated electropolishing, chemical demineralization and photoresist stripping equipment. It is designed to provide reliable and repeatable results for the removal of organic and inorganic contaminants from microelectronic device surfaces. The system is equipped with an environmentally-friendly, closed-loop process control that ensures protection of the operator, equipment and products. SEMITOOL RAIDER ECD-310 features a two-chamber design, consisting of an electropolishing chamber and a chemical demineralization chamber. The electropolishing chamber can be programmed to provide up to three different electropolishing cycles, allowing for maximum process flexibility. The chemical demineralization chamber is equipped with a recirculation pump that ensures a consistent solution concentration for reliable and repeatable results. The photoresist chamber is outfitted with high-pressure, high-temperature spray nozzles that are designed to thoroughly clean all photoresist and contaminants from device surfaces. Raider ECD 310 is equipped with a range of process parameters that can be customized to optimize the outcome of the electropolishing, chemical demineralization and photoresist-stripping process. Parameters such as temperature, pressure, chemical concentration, time and rate of change can all be adjusted to suit the needs of the application. The unit also offers a range of bath-life-enhancing options such as spin-filter technology, diffusion cleaning and carbon sedimentation. RAIDER ECD-310 is easy to install and operate. Setup and calibration is quick and straightforward, meaning users can start processing parts within a short time frame. The intuitive graphical interface allows users to easily adjust settings or monitor the machine's operation. The modules are also designed to operate independently, allowing one module to be used while the other is in process or stopped. SEMITOOL Raider ECD 310 is an advanced photoresist tool, designed to provide high quality, repeatable results. It features a two-chamber design, adjustable process parameters, spin-filter technology and an intuitive graphical interface, all of which make it an ideal solution for the cleaning of microelectronic device surfaces.