Used SEMITOOL Raider #293600285 for sale

Name: SEMITOOL Raider
Brand: SEMITOOL
SKU: 293600285
Availability: InStock

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Photoresist

Manufacturer

SEMITOOL

Model

Raider

ID: 293600285

Wafer Size: 12"

Vintage: 2008

Systems, 12" (8) Chambers Substrate: Si, 12" Chiller DHF Mix tank CO2 Bottle S2 Computer 502SE Controller Remote PPS MARATHON Standard Automation: Type: (2) FOUP WIP (PGV compatible) COAXIAL HT Robot STI Robot controller End effect controller: Edge grip Wet transfer edge grip FOUP ID: ASYST, P/N: 9750-2000-000 HERMOS RF Tag reader Vacuum source Wafer protrusion sensor Process module: CPC 1, 10, 12 Process: SRD / Prewet PTFE Spray chamber P/N: 271T0020-03 Rotor: Cantilever, N2 Wafer purge Bulk fill supply with filter, 5" IW Drain Spray bar nozzel, P/N: 341 T0011-05 CPC 2 Process: Ni plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 110T0198-01, 111T0000-10 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction (mechanical) Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 3, 4, 9 Process: Solder plating (eutectic) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact CPC 5, 6, 7, 8 Process: Solder plating (high lead) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 11 Process: Cu Plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 111T1197-01 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 50-55°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample Port CPC 2 Ni Plating solution Carbon polishing filter Conditioning electrodes pH Monitor Sight tube Power supply Tank 2: High lead solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample Port CPC 5, 6, 7, 8 Chemical: High lead plating Solution Sight tube Tank 3: Eutectic solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample port CPC 3, 4, 9 Chemical: Eutectic plating solution Sight tube Tank 4: Cu Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 25°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample port CPC 11 Cu Plating solution Sight tube Drains: IW Eutectic Hi lead Ni Cu Process: Cu Ni Eutectic High lead plating Options: (3) Heater chillers AARU Dl Booster pump cabinet and Interface Power supply: 480 V, 4 Wire, 3 Phase 2008 vintage.

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SEMITOOL Raider is a photoresist equipment launched in 2001 by semiconductor equipment manufacturer SEMITOOL. The system uses a spray-on coating to deposit a layer of photoresist on semiconductor wafers for subsequent patterning processes. Raider features features several computer-controlled components, including a load lock transporters, a spray arm and a particle control unit. SEMITOOL Raider processes up to 50 wafers per hour and produces uniform resist profiles across the entire wafer surface. It unloads wafers from a cassette, transports them to the spray arm, deposits the resist layer and transports them to an external conveyor. The spray arm is capable of applying thin (100-200nm) layers of SU-8 resist. The particle control unit ensures that the particles don't contaminate the photoresist and ensures uniform coating of the resist. It monitors the oxygen concentration, humidity, temperature and pressure in the spray chamber, as well as monitors the concentration of particles in the environment. Raider also has an autofocus unit which allows it to maintain constant focus on the entire wafer surface. SEMITOOL Raider has numerous safety features which protect against external factors such as static electricity build up and exhaust gas. Each of its systems can be individually calibrated for maximum precision and the spray arm is fully motorized for maximum control and accuracy. Raider is a modular machine, capable of upgrading its electronics and components with time. It has been designed in a manner that enables it to process wafers with diameters ranging from 1 to 12 inches. SEMITOOL Raider is a dependable tool of choice for photoresist applications in the semiconductor industry. It is low maintenance and can process large batches of wafers routinely without requiring an inordinate amount of supervision. It produces thin, uniform resist layers and ensures that the environment remains clean and particle free. Raider has been built with user safety in mind and its various safety features ensure that operators remain safe at all times.