Used SEMITOOL Raider #293635960 for sale
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ID: 293635960
Wafer Size: 12"
Single wafer processing system, 12"
Model No: RE12F2ECD1204
Substrate: Si, 12"
S2 Computer
502SE Controller
Remote PPS
MARATHON Standard
Interface: CDRU, AARU
(6) CCD Cameras
Process: Cu, Ni, Eutectic, High lead plating
Automation:
Type: (2) FOUP WIP (PGV Compatible)
COAXIAL HT Robot
STI Robot controller
End effect controller:
Edge grip
Wet transfer edge grip
FOUP ID: ASYST, P/N: 9750-2000-000
HERMOS RF Tag reader
Vacuum source
Wafer protrusion sensor
Process module:
CPC 1, 10, 12:
Process: SRD / Prewet
PTFE Spray chamber P/N: 271T0020-03
Rotor: Cantilever, N2 Wafer purge
Bulk fill supply with filter, 5"
IW Drain
Spray bar nozzel, P/N: 341 T0011-05
CPC 2:
Process: Ni Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 110T0198-01, 111T0000-10
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction (Mechanical)
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 3, 4, 9:
Process: Solder plating (Eutectic)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
CPC 5, 6, 7, 8:
Process: Solder plating (High lead)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 11:
Process: Cu Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 111T1197-01
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 50-55°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 2
Ni Plating solution
Carbon polishing filter
Conditioning electrodes
pH Monitor
Sight tube
Power supply
Tank 2: High lead solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 5, 6, 7, 8
Chemical: High lead plating solution
Sight tube
Tank 3: Eutectic solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 3, 4, 9
Chemical: Eutectic plating solution
Sight tube
Tank 4: Cu
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 11
Cu Plating solution
Sight tube
Drains: IW, Eutectic, Hi lead, Ni, Cu
Options:
(3) Heater chillers
Dl Booster pump cabinet and Interface
Power supply: 480 V, 4 Wire, 3-Phase.
SEMITOOL Raider is an advanced, automated photoresist equipment designed to meet the stringent performance and accuracy requirements of today's semiconductor and electronic components production. This system offers fully automated wafer exposure and processing capabilities, enabling manufacturers to maximize yields, reduce costs, and increase production throughput. Raider is equipped with a precision 8-inch exposure unit that utilizes 2048 beamlets and a 424 mm numerical aperture (NA) lens and can apply exposure fields of up to 30mm. This allows users to achieve the accuracy and resolution needed to deliver the highest-quality photoresist products. The exposure machine is also equipped with pullback alignment capabilities and automated substrate clamping and edge detection, allowing for accurate exposure and alignment across the substrate surface. In addition to its superior exposure capabilities, SEMITOOL Raider Photoresist Tool also features an advanced material management solution designed to streamline photoresist allocation and ensure the accuracy of recipe settings and parameters. This advanced software solution enables users to quickly and easily access, view, and update recipes for each type of photoresist without manual input. This eliminates the potential for error and ensures that all recipes are correctly structured and optimized for pristine performance. Raider also includes an integrated thin film measurement capability to allow customers to monitor quality throughout the photoresist asset's life cycle. This quality measurement solution enables automated and manual quality reviews, providing valuable data and analysis regarding resist thickness, uniformity, and coating quality. These capabilitiesI help to ensure consistency and performance throughout production while reducing both short-term and long-term costs. Overall, SEMITOOL Raider is a highly-sophisticated and advanced photoresist model that offers superior exposure, material management, and thin film measurement capabilities. Its automated processes help to maximize yields, reduce costs, and increase production throughput. With advanced capabilities and data analysis, manufacturers can depend on Raider to reliably deliver high-quality, high-accuracy resist products.
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