Used SEMITOOL Raider #9018339 for sale
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ID: 9018339
Wafer Size: 6"
Vintage: 2004
Wafer backside etcher, 6"
Configuration:
Process: backside and bevel etch/clean
Substrate: 6" Si with flats
Voltage: 380 V, 3 phase, 50/60 Hz, 5 wire
CE comp: yes
S2 comp: yes
Automation:
Type: 2 open cassette
Robot: STI single linear
End effector: edge grip
Pre-aligner: no
Cabinet:
Style: 2 chamber with WIP version 2
Material: PVC-C
Exhaust: bottom
Facilities: bottom
Fire supp: eng req (no external comp)
ULPA filters: standard (to cover both wafer handling area and chambers)
Process module:
CPC1/CPC2 backside layer etch
Chamber: 8" capsule
Rotor: 6" capsule I
DRVHD: capsule I
Auto: Raider L/R
MFC on N2 and IPA (top/bottom)
IPA vapor dry
Delivery systems:
Tank 1
Size: 20 L
Style: bottom draw
H/C: coils
Circ: recirc/reclaim
Filter: 5" 0.1 um
Level sensor: 3 floats
Pump: Levitronix BP-3 48 V
Supply: bulk fill
Delivery: CPC 1 & 2
Chem: dHF
Chemical trunk line delivered to bottom of CPC1/CPC2
SMTL transducer for all liquids
Drains: IPA, IW, HF
Options: (2) Affinity heater/chillers
Engineering required:
Cabinet
Elec pods
Automation
Process component integration
Electrical
Software
Plumbing layout
Gas flow monitoring and data logging
Robot interface
Manuals
Chiller/heater, 50 Hz, European
Chiller M75, 50 Hz, PD-2
2004 vintage.
SEMITOOL Raider photoresist equipment is an automated, high-throughput photolithography tool used to pattern features on a semiconductor device. The system is equipped with precision robotics that accurately pick and place semiconductor wafers from one process station to another. Raider features a laser interferometer for precise wafer positioning, a load-lock unit for precise temperature control and environmental cleanliness, and a 0.5 micron coater/developer for precise conformal processing. SEMITOOL Raider's photoresist coating station is designed to coat a thin resist layer onto the wafer to prepare it for photolithography. The machine provides resist coating rates up to 6 wafer per minute with accuracy and resolution as low as 0.1 micron. The coated wafer is then moved to the photomask station where an infra-red, or near-UV laser illuminates the desired patterns on the photomask. This allows for the illumination of very small patterns or complete circuit designs using the same photomask. Raider's scanner station allows for the programming of a specific scanning pattern for each wafer. This ensures that an individual feature or complete circuit design is accurately patterned onto the wafer. The resist patterns are then transferred to the wafer using SEMITOOL Raider's photoresist developing station. This station is also equipped with advanced temperature and humidity control to ensure a consistent process. Raider is designed to improve a photolithography process productivity while maintaining repeatable results. Due to its tight process control and repeatability, users can expect reliable, consistent, and cost-effective results. The tool is also highly compatible with process chemistries, integrating easily with various chemicals and materials. All of these features make SEMITOOL Raider an ideal choice for users looking for a reliable photolithography asset to process their semiconductor devices.
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