Used SEMITOOL RFS 500/700 #9216879 for sale

SEMITOOL RFS 500/700 (Resist Film Stripper) is a photoresist equipment that is used to strip, clean and dry photoresists such as photoresist masks, sputtered photoresist layers and photoresist stripes. It is designed to strip and clean photoresists on a range of wafers, or solar panels, or within a vacuum environment, with excellent uniformity. The RFS 500/700 is a single process module designed to generate the required pressure, temperature, and flow rate to obtain optimum results. It consists of a PD controller and a tri-gas manifold which control the necessary utilities, such as purging, backfilling and flushing of the process chamber. The unit uses a Micro sprayer to mix and spray the photoresist cleaning agent with nitrogen and water, as well as to remove any residues from the photoresist, with minimal impact on the underlying substrate. In addition, an adjustable five-point conveyor allows for uniform distribution of the cleaning fluid, to ensure that non-uniformed film removal does not occur. Once the photoresist is stripped and cleaned, it is then dried using a high-efficiency vacuum. This is done with the aid of a turbo-vacuum pump, which creates a high-velocity air flow that evaporates the solvent and humidified air molecules, allowing for the quick and safe removal of the photoresist. SEMITOOL RFS 500/700 is designed to provide consistent, repeatable results with a large variety of photoresist removing agents and substrates, as well as a wide range of temperature, pressure and flow rate criteria. It is constructed with an integrated power supply and ventilation system, and provides access to the process chamber through its dedicated secured software, which allows engineers to monitor the stripping and cleaning process. Overall, SEMITOOL RFS 500/700 is an effective and reliable photoresist unit, capable of removing wide variety of photoresists and substrates, within a high vacuum environment, for excellent uniformity. It is an ideal machine for any operation that requires the safe and consistent stripping and cleaning of photoresists and similar processes.