Used SEMITOOL / RHETECH ST-470S #9265372 for sale

SEMITOOL / RHETECH ST-470S
ID: 9265372
Wafer Size: 6"
Spin Rinse Dryer (SRD), 6".
SEMITOOL / RHETECH ST-470S is a high-end photoresist equipment designed to confer the highest quality of images onto a wide variety of substrates. The system starts by using a single-point laser to precisely localize the resist pattern on the substrate. The laser is then used to divide the substrate into a gridded pattern of multiple smaller units, allowing for finer control over the pattern fidelity. The photoresist unit also employs a high-precision, multi-axis motion control machine, allowing for increased pattern resolution and uniformity. In addition, the integrated software allows users to store various pattern settings and exact resist points for quick repetition and to minimize downtime when changing projects. RHETECH ST-470S photoresist tool utilizes the latest in imaging technology to ensure accurate and repeatable pattern etching. This asset employs continuous wave (CW) laser and an acousto-optic modulator (AOM) for precise focusing and energy levels to ensure consistent etching quality. Additionally, the photoresist model can easily adapt to both transmissive and reflective substrates. Further, the optical mask automatically aligns with the substrate for increased accuracy and precision. SEMITOOL ST-470S also comes with a comprehensive safety suite, including a class 1 laser enclosure for additional protection and peace of mind. Additionally, the equipment includes temperature control to ensure optimal resist adhesion and curing. Finally, the system is equipped with a variety of built-in interlocks to protect the user from any errant light or stray motion of the unit. Overall, ST-470S is an advanced photoresist machine designed to provide optimized performance in etching high-fidelity patterns. Optimal performance is achieved through the utilization of state-of-the-art technology, such as CW laser, AOM, and motion control, as well as through innovative design choices, such as temperature control and sophisticated safety protocols. The overall result is a photoresist tool that is reliable, precise, and user-friendly.
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