Used SEMITOOL / RHETECH ST-870 #9265368 for sale

SEMITOOL / RHETECH ST-870
ID: 9265368
Wafer Size: 6"
Vintage: 1997
Spin Rinse Dryer (SRD), 6" 1997 vintage.
SEMITOOL / RHETECH ST-870 Photoresist Equipment uses patented and advanced chemical development technology to enable precise patterning of metal, polyimide and photoresist materials. The system consists of four modules, which can be used independently or in combination to create photoresist features. The modules include a Mask Aligner, which uses a vacuum-based precision-patterned surface and micro-lenses to expose photoresist layers; the Mixer/Spreader, which aids in the uniform dispensing of photoresist onto the substrate; the Heater, which facilitates rapid curing for controlled crystallization, and the Refrel, which can achieve a high degree of etching or removing of photoresist layers. The Mask Aligner is ideal for applications that require precise and repeatable photoresist layer placement and patterning. The unit's designs incorporate advanced beam-splitting optical systems that result in a large, flat-field exposure with an even distribution of energy across the substrate surface. This ensures feature accuracy to ± 0.5 micrometers, low-voltage operation at 1.8 kV and a large, stable exposure field of up to 1.5 x 1.5 inches. The Mixer/Spreader offers precise control of photoresist dispense amount and the ability to condition resist liquid for improved coating uniformity. This enables low-defect photoresist layers for electronic applications. A variety of temperature and agitation recipes are available to tailor various aspects of development processes. The Heater is designed for rapid thermal curing of photoresist layers. This state-of-the-art heater design ensures a temperature stability of ± 0.2 degrees Celsius and in-process control over substrate temperature. The Refrel is an effective tool for cleansing polymeric surfaces. It offers precise control over etching rates and depths. It features a heated process chamber that is capable of reaching 285°C, and a design that enables full flexibility for various process steps, and helps to reduce substrate thermal shock. RHETECH ST-870 Photoresist Machine provides a range of capabilities for creating reproducible patterns on substrates for electrical, optoelectronic, and mechanical applications. The tool offers cost savings to manufacturers, precise patterning and uniform coatings, repeatability in production of various components, and reduced cycle times.
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