Used SEMITOOL / RHETECH ST-870 #9265370 for sale

SEMITOOL / RHETECH ST-870
ID: 9265370
Wafer Size: 6"
Vintage: 2010
Spin Rinse Dryer (SRD), 6" 2010 vintage.
SEMITOOL / RHETECH ST-870 is a photoresist equipment designed for advanced etching and patterning processes. The system was designed to offer a variety of feature sizes and aspect ratios, and is used to create nanoscale patterns for thousands of different electronic components. The photoresist unit includes an excimer laser, a beam scanning machine, a magnetic spatula, and a heated oven. The excimer laser beam is used to illuminate the photoresist material, which is then patterned by the beam scanning tool. The magnetic spatula is used to transfer the patterned material onto the substrate, such as a silicon wafer. The heated oven is then used to bake the photoresist to ensure a consistent surface. RHETECH ST-870 offers a variety of features to meet the needs of precision etching and patterning processes. It has a wavelength of 248nm, allowing for precise lithography. The asset also offers up to 40mm of field size for larger components, and is stabilized at 0.1 micron accuracy. The model has a flow control that can be set to 0.1-3 m/min depending on the focus point and substrate size. Additionally, SEMITOOL ST-870 has an active incident-angle control designed to minimize shadowing and optical loss. ST-870 is an excellent photoresist equipment that provides high speed lithography, precision patterning, and advanced etching for a variety of components. It allows for the creation of nanoscale patterns with accurate feature sizes and perfect aspect ratios. This system works with a variety of photoresists, making it a versatile and reliable option for advanced etching and patterning processes.
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