Used SEMITOOL S27-S-3-1-ML-WP #9209043 for sale

SEMITOOL S27-S-3-1-ML-WP Photoresist Equipment is a high end convection-based photoresist system, designed for precision microlithography processes. It is intended for photoresist coating and processing of small substrates such as high resolution photo masks for semiconductor and microelectronics applications. S27-S-3-1-ML-WP Photoresist Unit features a 3-axis control, which provides precision and repeatable operation, as well as a spacious substrate access chamber. It is equipped with an advanced, easy to use, user-friendly software machine, and comes with a convenient stainless steel storage cabinet. The tool offers polymeric substrate compatibility, which includes liquid, dry, and recoatable resists. This versatility allows for a variety of photoresist processes, including spin coating, slot coating, and swab processes, which are supported with comprehensive recipe editing and automatic programmable repeatability. In addition, SEMITOOL S27-S-3-1-ML-WP asset allows for maximum substrate temperature control, providing the most uniform distribution of photoresist material throughout the substrate. S27-S-3-1-ML-WP model is designed to achieve optimum accuracy and repeatability of process parameters. The advanced software and temperature control allow for precise exposure and development times. Additionally, the equipment includes an advanced flow control system, enabling precise and repeatable spin speeds and pressures. SEMITOOL S27-S-3-1-ML-WP Photoresist Unit is designed to meet evolving process demands of today's microelectronic and semiconductor industries, providing users with reliable, efficient performance. It features comprehensive and integrated process and fault monitoring, as well as a high-quality anodized aluminum construction. With its space-efficient design, S27-S-3-1-ML-WP Photoresist Machine is an ideal solution for space-limited production and laboratory settings.