Used SEMITOOL SAT 20605 #293830238 for sale

SEMITOOL SAT 20605 is a state of the art photoresist processing equipment designed to provide a precise, reliable, and cost-effective solution for processing semiconductor wafers and substrates. The system is designed to process wafers through a variety of techniques such as spin coating and post bake, image transfer, exposure, wet and dry etch, electroplating, and stripping. The entire unit is housed in four separate main modules for maximum efficiency and ease of use. The heart of the machine is the Resist Processor Module which is used to deliver photoresist to the wafers in a uniform pattern, to expose them to light, and to develop the resist after processing. The Processor module contains four stations and a number of other tools and components necessary to process wafers. The first station consists of a Spin Coater and associated heating elements which are used to evenly spread the photoresist onto the wafer and back-bake the resist to cure it. The second station contains a Mask Aligner which is used to expose the wafer to light patterns and to accurately place a mask onto the spin-coated wafer. The third station includes an Image Detectors to monitor and adjust for Light Intensity as well as a Substrate Hotplate for post-exposure bake. The fourth station contains a Plastic Resin Manipulator and a number of other components for wet processing the wafer. Following the photo resist processing and imaging, the wafers are moved to the Strip Module for wet chemistry and electroplating of the conductive film. The exterior of the module is similar to the Resist Processor, but the interior contains chemistry control to pre-clean and etch the silicon wafers as needed prior to electroplating. The tool also includes user adjustable plating parameters such as current density and depletion. The Strip Module also contains several additional wet processing tools such as a heated rinse station, spray-on resist stripper, non-chlorinated organic solvent, and an ammonium hydroxide treatment. All of these tools are designed to provide a complete suite of cleaning, etching, and electroplating capabilities. The third module in the asset is the Vacuum Module, which provides the capability to process more delicate wafer substrates such as glass and polyimide. This module is the most advanced in the model, utilizing a number of different techniques, including vacuum cure, binding ligands, soft bake, and exposure. The module contains a vacuum chamber, a number of other components and tools, and a Viewing Window for inspecting the substrates. Lastly, the module includes the Control Module, which contains the software and hardware necessary to control and monitor the equipment. The Control Module includes three separate control systems, which are used to monitor the process stages, system temperatures, and limits. It also includes a number of features such as data logging, maintenance alerts, recipe creation and control, and alarm notification. In summary, SAT 20605 Photoresist Unit is designed to provide a reliable solution for processing wafers in a cost effective manner. It is composed of four interconnecting modules, each with its own components and capabilities, and is coupled with a comprehensive Control Module to provide a unified and easy to use process control machine.