Used SEMITOOL SAT 3060 #9314452 for sale

SEMITOOL SAT 3060 photoresist equipment is a versatile and reliable piece of hardware designed to meet the stringent requirements of photoresist development. This system is built on a standard vertical track platform, which is capable of supporting components up to 300 kg. The unit includes a SEMITOOL E550 integrated spin-rinse-dry (SRD) platform which allows users to integrate wet bench top processes into their photoresist development. The E550 SRD platform includes the latest generation of recirculation filtration and centrifugal separation technologies, providing unmatched performance and increased longevity for wet process tools. In addition to the SRD platform, SAT 3060 photoresist machine also includes a number of production-grade features. The tool is designed to process wafers of up to 200mm, and can support development of hard, thick photoresist masks that are used in advanced electronic device manufacturing. The wafers are spun with the built-in programmable, multizone stepper motor, providing dynamic spin speed and acceleration for optimal chemical distribution. The asset also includes a 4-station hot-plate, which can be programmed for temperatures ranging from 65°C to 190°C. The 4 Zone Hotplate allows users to develop different recipes for different substrate rigs and applications, making it an ideal choice for complex processing requirements. The model also includes an included sink which provides a quick and effective way to bring the photoresist back to room temperature, eliminating potential contamination. SEMITOOL SAT 3060 photoresist equipment allows for easy maintenance and troubleshooting thanks to its user-friendly control panel. The user-friendly interface provides easy navigation and monitoring of the process parameters. It is also designed with a built-in modular safety switch system, which reduces downtime and increases production efficiency. Overall, SAT 3060 photoresist unit is a reliable and efficient photoresist development machine. Its customizable hotplate, spin speed selector, and wide range of temperature settings make it an ideal choice for processing both hard and thick photoresist masks. In addition, the tool's modular safety systems ensure that process parameters can be monitored to ensure quality and accuracy, as well as providing quick and effective troubleshooting systems.