Used SEMITOOL SAT1080SOA1PCAU #9120981 for sale

SEMITOOL SAT1080SOA1PCAU is a full-automatic photoresist spin and spray coating equipment designed to fulfill the requirements of advanced lithographic processes. The system provides precision automatic control of the spin speed, stagnation time, spray time, spray volume, and substrate temperature to ensure optimal material utilization and superior substrate performance. The unit is able to accurately meter a variety of photoresists for coating on substrates ranging from 4 to 12 inches in diameter. A dynamic vacuum process coupled with a 360 revolving stage allows substrates to remain perfectly stationary during spraying. The machine is equipped with an automatic cleaning function to ensure that no residue is left on the substrate between cycles. The tool features a proprietary, variable-speed AC synchronous motor. The motor is controlled by a digital control with variable settings that allow users to set any spin speed from 500 to 4500 rpm, as well as a variable spin time from 1 to 4 seconds. This enables users to accurately control the spin speed and amount of resist applied to the substrate. The built-in spray mechanism can deliver a variety of photoresists up to 6 milliliters (ml) per minute, allowing it to achieve the high throughput required for advanced lithographic processes. The asset also features a one-of-a-kind temperature control function that provides uniform heating of the substrate during the spraying process. This eliminates temperature differences that can cause material inconsistency, as well as raise process temperatures too high. The model comes with a comprehensive software package that allows users to customize settings such as spray cycle rate, spin speed, spray time, spray volume, and substrate temperature. These settings can be saved to a file and recalled when needed. The equipment also includes a graphical display that indicates the process status and features error codes for maintenance. For superior performance, SAT1080SOA1PCAU is a great choice for lithography laboratories that require precise and reliable photoresist spin and spray coating. The system offers a robust feature set, excellent precision, and easy operation, enabling users to optimize their processes for unique needs and ensure optimal material usage and superior substrate performance.