Used SEMITOOL Sirius #293671310 for sale

SEMITOOL Sirius Photoresist Processing Equipment is a reliable and efficient platform designed to optimize photoresist processing for microelectronic device fabrication. Sirius incorporates a unique and innovative design that employs patented technologies to deliver accurate processing results with each cycle. This stand-alone or integrated modular platform includes an efficient integrated platform with two independent track modules, modules with an open-frame design that will accommodate a variety of process vessels, and a variety of independent process modules. SEMITOOL Sirius Platform has two main modules, the Developer Module and the Stripper Module. The Developer Module consists of processes such as spin coating exposed photoresist layer, developing photoresist, and pre-pulse exposure. The Stripper Module consists of processes such as wet stripping, dry stripping, and ashing. The modules feature both manual and automated process control systems that allow operators to monitor process parameters and generate reports. The modules also come equipped with safety features that help protect against the hazards of chemical exposure. Sirius Photoresist Processing System offers high-precision process results and superior accuracy. The unit is built with dual-roof design that minimizes particle contamination and prevents heat exchange within the process chamber. Process temperature can be adjusted between 20-70°C and the machine is capable of accurately controlling the process pressure to within +/- 0.5 bar. SEMITOOL Sirius also allows for the customization of the process recipe to ensure optimum results regardless of the layer material and application. The tool also allows for the integration of different post-processing technologies such as ashing, etching, plasma exposure, and post-development removal. Sirius is designed to provide both process efficiency and quality assurance in photoresist processing. Its dual-roof design, integrated safety feature, recipe customization capability, and manipulation of process parameters all make the asset a reliable and cost-effective platform for photoresist processing.