Used SEMITOOL Spectrum #9384195 for sale

SEMITOOL Spectrum is a specialized photoresist equipment designed to provide the highest levels of control in the manufacture of semiconductor devices. This system utilizes both wet processing methods and dry processes to provide complete control over layer thickness and shape, and enables the production of highly intricate layers for ultra-detailed integrated circuits. The unit utilises reactive vapor deposition (RVD) of photoresist, which is highly advantagous in IC production since it can be used to produce thick photoresist layers with very low defectivity. The photoresist deposition process is divided into two main stages, each of which can be performed in either a wet or dry process. In the first stage a flat substrate is coated with the desired photoresist, and this is followed by a second stage during which the photoresist is converted into the desired pattern. The enabling technology of Spectrum is its ability to control the thickness of the photoresist layer. The layer thickness can be precisely controlled by controlling the amount of photoresist vapor that is deposited, allowing ICs to be designed with extremely fine details. The layer thickness is also adjustable to enable the production of substrates with different thicknesses. Furthermore, SEMITOOL Spectrum machine also provides an automated control tool for managing the dry and wet processes needed for photoresist production. This allows for the production of remarkably uniform thicknesses across the photoresist layer, providing the highest level of control over the appearance of the finished integrated circuits. Spectrum's control over the photoresist processes provides a level of accuracy in layer design which would be impossible with traditional methods. The features of the asset allow detailed designs to be mutated in just a few seconds, and also provides the ability to reproduce errors quickly making it an ideal model for mass production. SEMITOOL Spectrum combines the advantages of both dry and wet processing to enable the production of detailed integrated circuits with remarkable speed and accuracy. The accurate deposition control and management of the dry and wet processes enable a level of accuracy which would be impossible by traditional photoresist processing. This equipment is an essential tool for the production of complex integrated circuits with high reliability and performance.