Used SEMITOOL SRD-240S-6-1-E-ML #9366563 for sale

SEMITOOL SRD-240S-6-1-E-ML Photoresist Equipment is an automated wafer strip, resist and peel system that is designed to provide vendors and developers of semiconductor and IC technologies with the capability to efficiently, accurately and cost effectively deposit and strip photoresist for a variety of wafer preparation applications. This unit utilizes a strip-and-peel (SP) module that has one-to-six wafer capacity. The wafer is first held by a cassette or pod with the presence of a vacuum endoscope. Then it is transferred to the frame position where the photoresist is desposited. The resist is precisely rolled onto the wafer surface in a direction parallel to the wafer's planes via an integrated R2 machine. The resist is then left untouched for a few seconds, allowing the resist to set into the wafer surface. This setting can be done at an adjustable temperature from ambient to temperature above 200-degrees Celsius. The temperature is also adjustable by device type or the type of lithography. The tool is capable of automatically doing a full strip of the photoresist from the wafers using SRD-240S-6-1-E-ML's integrated PEELER asset, which is designed to use two different peel technologies; detergent- and solvent-based. The solvent-based process is used for sub-live-leveled structures and the detergent based process for junction technology. Furthermore, the model is designed with a built-in dryer that can be used to further remove moisture. The dryer can also be used to precondense the environment in order to obtain the ideal resist condition for removal. The users can also adjust the process parameters such as the temperature, flow rate and rate of rotation to get the desired results. SEMITOOL SRD-240S-6-1-E-ML also has an integrated defect-inspection equipment that allows users to detect and measure wafer defects, which is very important in controlling the process results. Additionally, the system has a real-time monitor of the process parameters to ensure that the process is optimally run. All in all, SRD-240S-6-1-E-ML is an excellent photoresist unit for manufacturers of semiconductors and IC technologies. This machine is efficient, accurate, cost effective, and easily adjustable to suit the needs of different types of processes. This tool ensures that users get the best, highest quality results in their wafer preparation application.