Used SEMITOOL SRD 440 #9223322 for sale
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ID: 9223322
Vintage: 1997
Spin Rinse Dryer (SRD)
Model no: 440S31EML
Single chamber
Maximum rotor substrate diameter: 4"
Compliant poly cabinet: FM 4910
Brushless controller: PSC-101
Quick disconnect (QD) rotor: 3"
PFA Cassette (A82M0215)
Includes:
DIW
N2
Exhaust
Power supply: 120 VAC, 60 Hz
1997 vintage.
SEMITOOL SRD 440 is a state-of-the-art photoresist equipment designed to accurately expose, develop, and strip photoresist layers used in the MEMS, semiconductor, and optoelectronic industries. It features an advanced 4-beam Coherent Visible Light Source, together with sensors and a computerized feedback system that enable precise alignment and focus control. The four beams have individual intensity controls for fine-tuning exposure requirements. In addition, the software includes a screensaver mode for automatic mask alignment when the unit is in idle. The optical unit incorporates a flat-field lens that maximizes lens correction uniformity. A camera on the front panel allows easy visualization of the mask alignment process. SRD 440 also has a precision wafer positioning stage with two axes and two levels that ensure accuracy and repeatability. The stage allows precision adjustment of the wafer to the focus position, guaranteeing lined-up patterns on the finished product. It also has a unique automatic wafer loading feature that automatically captures and loads up to 25 wafers, reducing manual handling time and associated errors. The platform incorporates an automated process selector that allows for quick, tool selection and calculation of development time. The software interface also allows for easy integration with other tools in the factory. SEMITOOL SRD 440 combines a reliable, precise photoresist machine with easy maintenance and operation, making it the perfect photoresist tool for high-end research and production environments. It has the capacity to handle a variety of processes, from detailed microfabrication to large scale production runs. The efficient operation and user-friendly controls ensure that this photoresist asset can achieve increased throughput and quality.
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