Used SEMITOOL SRD-8300S #9272599 for sale

SEMITOOL SRD-8300S
Manufacturer
SEMITOOL
Model
SRD-8300S
ID: 9272599
Spin Rinse Dryer (SRD) Dual stack.
SEMITOOL SRD-8300S is a photoresist equipment designed for mass production of ultra-fine micro devices. It is an advanced, efficient and highly reliable system for wafer processing. It features an integrated, hybrid design with a single-flip-open chamber for the resist processing, the bake plate, the heating plate, the spray nozzle, the pre-spin/pre-bake unit and, optionally, a wet bench. SRD-8300S utilizes a wafer lower process cassette to ensure proper alignment of the wafer and substrate throughout the process. It's driven by a powerful air bearing motor and a vacuum spindle for secure alignment. The unit is also equipped with an automated wafer handling machine and robotic arm for easy wafer loading and unloading. SEMITOOL SRD-8300S features new technology toallow clean, uniform and precise photoresist applications. It has a new 5-inch Quartz-coated window for a low-defect spray mode and a new Micro-Fine image Lens with selectable ports for air atomization drying particles. It has a user-selectable run frames option for process customization and other features include a manual/auto mode switch and self-diagnostics tool. The asset also incorporates a powerful controller to monitor temperature and conditions to ensure uniformity and repeatability in the process. It has a real-time display of critical parameters and a standard RS-232 serial port for networking with a PC or other proprietary automation equipment. It also features a unique dual-direction nozzles, which enable precise, uniform spray jetting. SRD-8300S is a reliable and efficient photoresist model for advanced wafer processing. With its high-performance air bearing motor, quartz coated window, and Micro-Fine image Lens, it provide unparalleled uniformity and repeatability. Moreover, its automated wafer handling and controller monitor temperature and conditions for uniformity in the process. Moreover, it's user-selectable run frames option make the equipment an ideal choice for photoresist application and mass production of ultra-fine microdevices.
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