Used SEMITOOL SRD-840S-1-1-E-ML #9279229 for sale

SEMITOOL SRD-840S-1-1-E-ML Photoresist Equipment is a state-of-the-art wafer processing system designed to meet the needs of advanced chip fabrication. The heart of the unit is the proprietary SRD-840S-1-1-E-ML chamber, which is designed to provide uniformity of dispense and patterning of photoresist from chip to chip and from die to die. The machine allows the user to quickly process wafers with precision and repeatability. The tool is capable of hosting up to eight concurrent processes at any time, for both wet photoresist dispense and patterning capabilities. It also has a process flow controller which allows users to add and subtract processes as needed. The asset also has a high-resolution imaging subsystem to enable fast and accurate determination of patterning and uniformity of each batch of wafers. SEMITOOL SRD-840S-1-1-E-ML has a unique higher cabinet temperature control range that helps reduce photoresist baking time and retains excellent patterning accuracy.The model also features a liquid level detection equipment which helps prevent contamination and enables the user to track usage of solvents. It also includes innovated technologies such as iMAP (Integrated Movement Accuracy Principle) that assists with maintaining exacting accuracy and eliminating vibration during operation. This photoresist system further utilizes ILS (Intelligent Laser Source) to provide high speed write processes, deterministic patterning with sharp edges and no overlay errors, and an expanded library for recipes and patterns. The unit also comes with built-in cleanroom motion control and event control which helps reduce maintenance time and time in the cleanroom for operators. Additionally, SRD-840S-1-1-E-ML includes proven vacuum technologies and chemical management systems, both of which increase uptime, while simultaneously lowering operating costs. Overall, SEMITOOL SRD-840S-1-1-E-ML Photoresist Machine is designed to help chip fabrication operators reduce processing time, enhance photoresist patterning accuracy and reduce cycle time. This tool's high-performance features and functions have become an essential part of semiconductor processing in today's advanced chip fabrication market.