Used SEMITOOL SRD #9198117 for sale

Manufacturer
SEMITOOL
Model
SRD
ID: 9198117
Spin rinse dryer.
SEMITOOL SRD is a photoresist equipment designed to deliver high-resolution test patterns for semiconductor wafer processing applications. It is ideal for research and development on emerging applications such as 3D interconnect and MEMS devices. SRD system can process up to 8" (200mm) wafers and incorporates a high-resolution projection photolithography unit, wafer stage, hot and cold plates, resist spin coating/drying, wafer heating/cooling, and in-line metrology tools. The machine is based on advanced projection optics and a motorized XY stage to perform wafer exposure. The projection optics feature an adjustable lens tool which can be adjusted to provide high-resolution patterns in both proximity and projection lithography. The optics are capable of producing exposure patterns with a resolution down to 0.4 microns. A resist spin coater/dryer module is included with SEMITOOL SRD asset. It is capable of spinning chemicals such as photoresist solutions, and drying the surface of wafers to prepare the wafers for exposure. An integrated wafer heating/cooling model allows for precise temperature control of the wafers during exposure. SRD equipment also includes advanced in-line metrology tools to monitor the process and to ensure high-resolution patterns. The metrology tools use optical imaging, laser interferometry, and confocal microscopy to measure and analyze the exposure patterns during the lithography process. These tools enable better process control and help to ensure the highest performance from SEMITOOL SRD system. Overall, SRD is a versatile, high-resolution photolithography unit for a wide range of semiconductor wafer processing applications. Its projection optics, resist spin coater/dryer, temperature control machine, and in-line metrology tools all contribute to its ability to produce detailed patterns with high precision.
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