Used SEMITOOL SRD #9213261 for sale

SEMITOOL SRD
Manufacturer
SEMITOOL
Model
SRD
ID: 9213261
Wafer Size: 6"
Spin Rinse Dryer (SRD), 6".
SEMITOOL SRD is a photoresist equipment designed primarily for the use in semiconductor testing, fabrication, and repair. It provides precision, high-speed processing of both thick and thin photoresist films on integrated-circuit substrates. The system can be used for a wide range of applications in semiconductor processes, including patterning, etching, deposition, lithography, and electron-beam writing. SRD is a fully automated unit with a four-axis design, including a wafer lift, loadlock chamber, rotation base, and secondary chamber. The machine is equipped with a multi-position wet-chemical process station to optimize lithographic process results. It comes with an optional high-resolution, high-speed video camera that can be used for inspecting and adjusting pattern locations and dimensions. The loadlock chamber of SEMITOOL SRD works in a robotic tool that transfers wafers quickly without undesirable air contamination. The lift platform holds up to fifty wafers with a range of options for single- or double- sided patterning. Additionally, SRD is equipped with an onboard cooling asset (up to 100kPa) to uniformly cool wafer surfaces. This guarantees reproducible features even with large feature sizes. The model process chamber of SEMITOOL SRD is made of stainless steel, providing excellent repeatability and reproducibility. Its large interior is designed with an internal height of 500 mm, capable of accommodating a variety of sizes of wafer stages. Its vacuum pressure can be tuned down to 0.0005 mbar. SRD also possesses a standard wafer rotation station for up to 100 RPM speeds. In addition, SEMITOOL SRD includes a multi-position wet chemical station that is essential for performing lithographic processes like wet-etching and dry-etching. The unit includes an integrated RT recirculation equipment for heating and cooling the process module. It also includes several additional components such as shower heads, plasma etch, sputter deposition modules and other cleaning labs. The latest version of SRD is a modern semiconductor wafer process system that combines precision and utility in a single package. It is designed to use a high-intensity UV light source, high-resolution sample imaging unit, a comprehensive selection of process modules and access to most process chemistry. The machine is powerful enough to process thousands of wafers per hour and securely store data, allowing users to streamline their workflow.
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