Used SEMITOOL SRD #9292751 for sale

SEMITOOL SRD (Spin Rinse Dryer) is an automated wafer processing equipment used for the removal and replacement of photoresist. Photoresist is a light-sensitive material used in the manufacture of semiconductor devices, usually after lithography. SRD system is designed to improve process efficiency and yield, while decreasing processing and cycle times. SEMITOOL SRD unit consists of four distinct parts: the spin-rinse station, the dryer station, the photoresist station, and the substrate staging station. The spin-rinse station places the wafer in a spin bath and agitates it to remove the photoresist. The dryer station uses a combination of heat and gas pressure to quickly and safely remove any residual liquid from the wafer surface. The photoresist station is used to apply the fresh photoresist for the next process step. Finally, the substrate staging station is an enclosed environment for marking, transferring and storing the substrates during the process. SRD machine is highly adjustable and adaptable, capable of processing different substrate sizes and types, including silicon and gallium arsenide. In addition, SEMITOOL SRD tool is designed to be integrated into other systems in the factory, allowing components to move through the entire manufacturing process as efficiently as possible. The automation of the entire process, including the spin-rinse operation and the dryer, makes it possible to rapidly move wafers through the process while still providing high quality results. SRD asset is easy to use and offers a wide range of features to customize the process. For example, SEMITOOL SRD can be tailored to specific product requirements and process settings - such as wafer diameter, speed, spin angle, spray types, etc. - enabling users to optimize the process for their particular application. The automation of SRD also reduces the requirement for operator involvement and enables the model to be integrated with other systems in the factory. In conclusion, SEMITOOL SRD is a versatile, automated photoresist equipment designed to improve process efficiency and yield, while decreasing cycle and process times. It offers a range of features that enable users to customize the process for their particular application, and can be easily integrated into existing wafer processing systems.