Used SEMITOOL SRD #9399678 for sale

SEMITOOL SRD (Spin Resist Developer) is a spin-applied photoresist equipment for use in semiconductor wafer processing applications. It is designed for high-density, high-precision processing of integrated circuits (ICs) used in a variety of electronic components. This system enables fast, accurate, and reliable fabrication of ultra-precise features and patterns on wafers. SRD uses advanced processing techniques and is the most advanced photoresist unit available. It utilizes a spinning station that spins the wafer at a high speed, combining it with a rotating brush to provide a uniform coating of photoresist on the wafer. This process enables extremely accurate resist development across the entire wafer. SEMITOOL SRD machine is designed for processing of ultra-precise features and patterns, such as dual-patterning, fine-line lithography, and multi-level patterning. It also features an automated resist delivery function that simplifies resist application and development. This feature helps to reduce overall processing time without sacrificing accuracy or precision. Additionally, the tool also utilizes a tracking asset that ensures that the wafer is processed under the optimal conditions for achieving the desired feature and pattern requirements. The model is also highly flexible, providing easy access to a wide range of settings. This allows users to tailor the settings to their specific needs, enabling them to reliably produce the highest quality wafers possible. Furthermore, it offers support for different photo-resist formulations, enabling users to choose their preferred formulation without sacrificing the processing accuracy and precision. Overall, SRD equipment is a powerful and reliable photoresist system that enables users to fabricate highly accurate features and patterns on their wafers. The unit's advanced processing techniques and automated resist delivery functions significantly reduce processing time, ensuring consistently high-quality results. Moreover, it offers easy access to a wide range of settings and compatibility with different photo-resist formulations, helping users achieve their desired results.