Used SEMITOOL SST-201 #293653189 for sale

SEMITOOL SST-201 photoresist equipment is a high-tech tool for developing photomasks and other advanced microelectronic products. It combines an array of advanced features to ensure superior results to those achieved with conventional photoresist systems. SST-201 includes a high-precision stage to accurately move objects, programmable electronic controllers to control timing, temperature, pressure, and other parameters, and precise positioning motors for precise image placement. It also offers elegant graphical user interface, so that users can easily modify, save, and repeat processes. This system works with a wide variety of photoresist materials to provide clean and reliable imagery, including dry film, liquid and hybrid photoresist. SEMITOOL SST-201 also includes a variety of advanced features to maximize photomask quality and efficiency. SST-201 provides a full range of imaging capabilities, from simple dot patterns to complex line patterns and high-resolution images. It also provides multiple exposure steps, with programmable exposure times and intensity control. The unit allows users to quickly fine-tune the imaging process for optimal results. SEMITOOL SST-201 features a powerful automated process controller, with many easily programmable functions. Its smart memory controls ensure that all imaging parameters are automatically copied from the user's environment to SST-201, allowing the machine to operate under the exact same conditions throughout its production. In addition, SEMITOOL SST-201 includes advanced features to ensure efficient operation. Its innovative process simulation capabilities allow users to accurately test designs before running the actual production process. It also includes an interactive help tool to ensure the process is followed correctly and reproducibility is ensured. Overall, SST-201 photoresist asset is a powerful and reliable tool for users who require precision and efficiency. It provides an array of advanced features to ensure accurate imaging and facilitate automation of the production process. It is ideal for developing photomasks, and other advanced microelectronic products, and suitable for use with a wide variety of photoresist materials.