Used SEMITOOL SST-202A #9265775 for sale

SEMITOOL SST-202A is a photoresist equipment designed for precision patterning in lithography applications. The system provides a wide range of process solutions, allowing for efficient and accurate patterning of a variety of substrates. SST-202A is comprised of a lithography track to produce structures on substrates with high fidelity, an Automated Unit Controller (ASC) for power control, and a spin coater for precise application of photoresist. SEMITOOL SST-202A also includes an optional plasma asher, exposure unit, and lift-off unit for further control of the patterning process. SST-202A is able to process solid substrates of up to 8 inches in diameter, as well as thinned substrates such as MEMS, OLEDs, III-V compound, and power devices. The machine uses a film thickness monitor to ensure uniform photoresist coating during spin coating. The photoresist is then exposed to UV light for patterning. The ASC of SEMITOOL SST-202A has advanced features to control processes in real-time. It has a data logging tool to track process parameters, as well as step-by-step instructions for maximum efficiency. The ASC also allows for automatic calibration of exposure energies for a variety of photoresists and substrates. The optional plasma asher allows for efficient removal of photoresist residues and other contaminants from the patterned substrate. The asher uses an RF source to create a plasma within a vacuum chamber, resulting in a uniform etch profile across the substrate. The optional UV exposure unit provides for precise exposure of the pattern on the substrate. The unit has a variable frequency lamp, providing adjustable exposure times from 10 ms to 10 seconds. The optional lift-off unit can be used for removal of the photoresist from the substrate after patterning is complete. A heated platen with an inert gas supply is used to lift off the photoresist with minimal damage to the substrate. Overall, SST-202A photoresist asset provides a single platform for lithography processing of a variety of substrates with high accuracy and repeatability. The model is equipped with advanced features to ensure efficient and precise patterning of substrates for a variety of applications.