Used SEMITOOL SST 2061D #142241 for sale

SEMITOOL SST 2061D is a photoresist equipment designed to help users utilize their implemented lithography processes. It is a compact, robust and user-friendly system, suitable for a wide range of wafer sizes and processes for advanced microfabrication lithography requirements. The unit features a patented design to ensure accurate and efficient processing of various complex substrates. It also supports multi-resist integration, providing the user with greater flexibility and wider process windows. The machine offers superior edge definition while reducing residue and particle formation. SST 2061D has a maximum chamber volume of 363 liters, which can accommodate up to 200mm wafers. It is equipped with a dispense tool, light source, and temperature controller. The key component, the Pattern Generator, is housed inside the optical chamber and is capable of spinning the wafer at speeds up to 1600 RPM. The wafer is loaded onto a multi-level Ultima Gold stage and then exposed to the light source. The lower distortion Lambda function generator and the photoresist dispense asset then work together to produce precisely defined patterns. The model is designed to provide users improved photoresist process performance through its open chamber design, CleanPlus Technology filtration equipment and stable substrate temperature, controlled by an integrated chiller. The system also features a clean room based computer controller with a graphical user interface (GUI). SEMITOOL SST 2061D is suitable for a wide range of photoresist processes, from simple to complex. It offers advanced technology to create superior edge definition, better field boundary control and reduced feature sizes, all with low particle formation. It is also capable of low temperature processing for enhanced material compatibility. Overall, SST 2061D is an advanced photoresist unit that integrates the latest technologies to offer superior process performance. With its high-performance design, easy user interface, and durable construction, it is a powerful tool in helping achieve desired lithography results.