Used SEMITOOL SST-614-AG #9043971 for sale

SEMITOOL SST-614-AG is a photoresist equipment designed for wafer processing applications. It is a "stand-alone" unit specifically designed to apply and develop photoresist solutions on silicon wafers. The core components of this instrument are a wafer transfer station, spin spray track, clear bath track, spin sprayer and an Allmighty track. The wafer transfer station allows an operator to manually load or unload single wafers from the system. This transfer station enables vertical and horizontal adjustment for orientation of the wafers. The Spin Spray Track is designed to allow precise spin dispense of the photoresist solution onto the wafer. This creates a uniform coating of the photoresist, yielding an even profile onto the wafer. The Clear Bath Track consists of a single vessel that is filled with an aqueous or non-aqueous developer solution and function as a wash station. The sprayer applicator within the bath track ensures an even spread of the developer solution across the wafer to enable more efficient photo-developing. The Spin Spray track can also be used in conjunction with the Clear Bath Track to create a uniform photoresist profile on the wafer. Lastly, the Allmighty track is responsible for accumulating resist residue from the spin-spray within the unit and disposing it to clean rinse tanks outside of the unit. It is a filtering machine that also has a capacity of up to twelve Standard 200mm wafers. In conclusion, SST-614-AG is a complete photoresist processing tool for developing photoresist solutions onto silicon wafers. It is equipped with many features including a wafer transfer station, spin spray track, clear bath track, spin sprayer, and an Allmighty track to ensure uniform and efficient processing. This photoresist asset can improve production rates and ensure optimal results for photoresist processing applications.