Used SEMITOOL SST-742 #9292670 for sale
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SEMITOOL SST-742 Photoresist Equipment is a state-of-the-art solution for processing photoresist materials used in today's rapidly advancing semiconductor, optoelectronics and microelectronics technologies. It offers superior flexibility, performance, and reliability for processing photoresist materials with the most demanding features and thickness control. SEMITOOL SST 742 Photoresist System provides rapid, high-performance spin coating for various substrate sizes and shapes. It features user-selectable spin speeds, up to 4000 RPM, and adjustable spin times allowing for tight control. It also offers easy, one-step coating thickness adjustment, making repeatable results quick and easy. For improved work-piece stability, the unit also features an advanced vibration-dampening air cushion. The machine is equipped with an integrated temperature control tool, allowing for more precise coatings on sensitive substrates. It also includes a versatile, fully controllable programmable post-coating bake profile capability, enabling process optimization. All of these features are designed to help ensure uniform, repeatable thicknesses with minimal resistance variation. SST-742 Photoresist Asset also offers robust design and superior model reliability for superior long-term performance. It is designed to manage a variety of photoresist formulations, including negative, positive, and clear resists. Thanks to its large, adjustable fluid reservoir, it also accommodates a wide range of photoresist compositions. In addition to its wide range of capabilities, SST 742 Photoresist Equipment is equipped with a variety of user-friendly, intuitive controls. The system features an easy to read, backlit LCD touchscreen display, providing simple and intuitive control over unit parameters and modes. It also includes automated software functions and safety features, including flexible pre-programmed cycles for productivity and process consistency. SEMITOOL SST-742 Photoresist Machine is a powerful and reliable solution for precise, high-performance photoresist processing. It provides the superior precision and control required for the most demanding photoresist applications, helping to ensure repeatable results and optimal yields.
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