Used SEMITOOL SST-C-421-280 #9144801 for sale

SEMITOOL SST-C-421-280 is a fully automated photoresist equipment consisting of two processing chambers, capable of processing up to 161 wafers in one load, and can work as either a single-chamber or two-chamber system. The processing chambers are constructed of tempered stainless steel and have an adjustable 3-zone precision controller and process timers to optimize the thermal uniformity and the overall unit throughput. The first chamber features a photo imaging track which uses a high-payoff low distortion vacu-folded lens (VFL) scanner in order to achieve optimal wafer coverage. This scanner moves at 7 to 60 mm per second over the wafer surface to allow for maximum accuracy and throughput. The process head of the imaging machine can range from 600mm to 600 mJ/cm² for greater control of image edge profiles and risers. This track also features an adjustable heating space for processing times of up to 60 minutes which is ideal for imaging longer wafer structures. In order to achieve maximum flexibility, the second chamber is capable of initiating single wafer immersion and spray developing cycles. The immersion development tool consists of a Height-Controlled Platform (HCP) and Jet Pump Overlay to minimize part damage and provide superior part coverage. The HCP is adjustable from 0.2 to 4 cm in Z-axis for controlling the part throughput and is compatible with many solvents including H2O2, phosphoric acid, and others. The spray development asset has been designed for optimum accuracy and repeatability and provides a superior leveling profile with minimal distortion and part damage. It allows the spray nozzle to move in both the X and Y directions, enabling circular or x-y-z spraying, and can deliver up to five spray developing cycles per wafer. Finally, the model also provides an optional Single Wafer Dryer (MWD) for drying critical processes. This powerful yet energy efficient dryer uses multiple heat radiators to evenly heat the wafer to a temperature of 90°C to achieve maximum temperature uniformity and low thermal stress. In conclusion, SEMITOOL SSTC421280 is a fully automated photoresist equipment designed to provide maximum flexibility and optimal accuracy. Its dual processing chamber setup is ideal for processing up to 161 wafers in one load, while its high-payoff low distortion vacu-folded lens scanner, immersion development system, and single wafer dryer all help to deliver superior results with minimal part damage.