Used SEMITOOL SST-C-621-280 #9360715 for sale

SEMITOOL SST-C-621-280
Manufacturer
SEMITOOL
Model
SST-C-621-280
ID: 9360715
Spray solvent system.
SEMITOOL SST-C-621-280 Photoresist Equipment is a state-of-the-art multi-zone, single-chamber liquid and dry semiconductor inline process tool used for coating, developing, and stripping photoresist. The system is well suited for 200mm and 300mm wet-process and dry-process production lines. It is capable of bulk or small batch production and is designed to minimize downtime while reducing overall production costs. SST-C-621-280 is equipped with a fully automated loading unit for dry-film photoresist that can be handled without special equipment. The cabinet-enclosed machine maintains a controlled environment to ensure optimal film quality and uniformity. The independent control zones can be configured for a variety of temperature, speed, pressure, and chemical parameters. The dry-film photoresist is loaded onto the chamber's set of rotating process wheels, with each of the 6 zones adjustable independently for particular process parameters. SEMITOOL SST-C-621-280 has a specialized scrubber/developer wheel, for use at the end of the process cycle, which removes excess photoresist solution and particles. The scrubber wheel is adjustable to three pressure settings which can be configured to the particular needs of the end-user. The photoresist tool also includes a proprietary vision-inspection asset which inspects the film quality after each processing cycle. This inspection process helps to minimize batch and wafer-to-wafer inconsistencies, and can detect and identify particle, lithographic, and processing defects. The model's cryo-cooling feature cools wafers quickly and effectively, helping to alleviate surface damage caused by prolonged processing. SST-C-621-280 is also equipped with a number of optional and advanced features, such as process review software, plasma pre-process, and auto-loop integration. SEMITOOL SST-C-621-280 is designed to help streamline semiconductor production by providing reliable performance and high-resolution imaging and film thickness accuracy. It is an easy-to-use and highly sophisticated tool for wet- or dry-process production lines, capable of large volumes of production with quality control parameters built into the equipment.
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