Used SEMITOOL SST-F-421-280-F #9410289 for sale

Manufacturer
SEMITOOL
Model
SST-F-421-280-F
ID: 9410289
Wafer Size: 6"
Vintage: 1995
Spray solvent system, 6" Missing parts 1995 vintage.
SEMITOOL SST-F-421-280-F is a state-of-the-art full-field photoresist processing equipment. It offers a wide range of customizable features that allow it to achieve consistently accurate etch results. The system, which is suitable for use in a variety of industries, ultimately serves to help accurately pattern surfaces for use in a range of products and applications. At the heart of SEMITOOL SSTF 421280F is its beam-on-board (BOB) tooling unit, a field-proven tool that enables users to pattern accurately and consistently. This machine uses calibrated heads to precisely target and approach the resist wafer, ensuring only the most precise patterns are created. Additionally, the tool's depth-off-the-surface-control (DOTSC) asset offers flexible exposure parameters and improved exposure consistency, allowing users to achieve very detailed, accurate and high-performance resist profiles. Furthermore, the model features SEMITOOL proprietary DSC-EDM (Digital Sub-Carrier Extended Defocus Mode) mode, which increases focus and accuracy. This feature provides very accurate covering uniformity, and also allows users to create patterns with excellent sidewall straightness and uniformity. Additionally, SST-F421-280-F offers users tool-image-guided autofocus, which helps to ensure accuracy and quality of the exposed areas. Moreover, the equipment is incredibly simple to use and maintain. The user friendly setup process makes it easy to program and use the system, while built-in self-monitoring capabilities ensure users remain informed of the unit's performance at all times. In conclusion, SSTF 421280F is a highly advanced photoresist-processing machine, tailored to precision and accuracy. Its beam-on-board tooling tool, depth-off-the-surface-control, DSC-EDM mode, and tool-image-guided autofocus allow for the creation of highly detailed and accurate patterns, resulting in extremely high-performance profiles. Additionally, users benefit from the asset's ease of use and built-in monitoring capabilities.
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