Used SEMITOOL SSTF 421270F #9265379 for sale

SEMITOOL SSTF 421270F
Manufacturer
SEMITOOL
Model
SSTF 421270F
ID: 9265379
Wafer Size: 6"
Spray solvent system, 6".
SEMITOOL SSTF 421270F photoresist equipment is a next-generation spray photoresist platform that offers increased throughput and improved process control. The system, developed by SEMITOOL, uses spray-on resist technology for the rapid and accurate deposition of photoresist material onto substrates. The unit operates with up to 60" (152 cm) of web width and boasts full automation with dynamic recipe control. The machine requires minimal operator interaction to maintain process consistency and improve yields, as it enables automated resist flux densitometry and uniformity measurements. The spray-on resist process takes place in the tool's Spray Chamber. The Spray Chamber includes a spray gun that dispenses a precise amount of photoresist onto the substrate, as specified by the process recipe. This precise application of resist consolidates the resist layer into a compact film that uniformly covers the substrate and prevents contamination or buildup. Once resist has been applied, the asset's recirculation loop allows for reusage of unused photoresist to reduce material waste. SSTF 421270F also features an integrated vision alignment model that scans the substrate pattern for misalignment or defects, allowing the operator to perform real-time layout correction. The equipment's high-resolution cameras ensure full coverage over the substrate without the need for manual mask alignment. An advanced cleaning system further enables increased automation and improved process control, as it allows for the use of a variety of different chemicals to clean the substrate before and after spray coating. The cleanliness of the unit is monitored through an on-board particle sensor and an in-situ ozone generator. SEMITOOL SSTF 421270F is also equipped with an intelligent process control machine that automatically identifies process variables and adjusts the spray parameters accordingly. This automation significantly reduces operator input, optimizing and standardizing the resist layer. To further optimize the sensitive resist layer, SSTF 421270F includes a moisture-controlled environment that maintains a constant humidity level. By ensuring that the spraying environment is properly conditioned for the substrate, the tool can prevent the resist layer from shrinkage or softening. Overall, SEMITOOL SSTF 421270F is an advanced, automated spray photoresist platform that offers increased throughput, enhanced process control, and precise resist layer formation. Through its integrated vision alignment asset, automated cleaning model, intelligent process control, and humidity control, the equipment helps maximize yields and reduce scrap. As such, SSTF 421270F is a next-generation solution for those in need of an optimal photoresist system.
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