Used SEMITOOL SSTF221280MBT #293628579 for sale

Manufacturer
SEMITOOL
Model
SSTF221280MBT
ID: 293628579
Wafer Size: 12"
Spray solvent system, 12" (2) Tanks (Heated).
SEMITOOL SSTF221280MBT is an advanced photoresist equipment designed for use in a variety of photolithography and wafer processing applications. It features an innovative design that allows for the precise control of light exposure and optical characteristics, including optimization for both dark field and bright field applications. With its powerful processing and command capabilities, this system provides a cost-effective, efficient solution for a variety of front-end semiconductor applications. At the heart of SSTF221280MBT is its SSTF-21200MP photoresist unit, which includes not only the necessary optics, but also an integrated particle removal machine and vacuum tool. This powerful photoresist asset offers the capability to autofocus accurately and quickly with a wide adjustable aperture and fine tuning of the exposure parameters to maximize throughput. The autofocus provides a clear line of sight with the previous lens, eliminating any distortion from the imaging model. Additionally, multiple resist layers can be processed using the laser-based illumination equipment. SEMITOOL SSTF221280MBT also features an integrated wafer support system, which can be configured for up to three wafer sizes and thicknesses. The wafer transport unit eliminates the need for manual wafer handling and minimizes the potential for breakage or contamination. SSTF221280MBT is designed to work with a range of photoresist materials, including krylon, terbine, and amine types. The machine supports both post-exposure and pre-exposure bake mode, giving users the flexibility to configure the process to maximize throughput and minimize defects. Pre-exposure bake mode allows for the rapid processing of multiple layers of photoresist with a single substrate. SEMITOOL SSTF221280MBT integrates with a variety of particle removal systems for optimal wafer cleanliness. This tool features automated pre-cleaning, post-cleaning, and wipe capabilities. The cleaning solution is applied through a nozzle vent in the upper part of the asset with adjustable flow rates, ensuring effective cleaning and drying of the exposed wafer surface. SSTF221280MBT also includes an intuitive control panel, which allows operators to easily set functions, monitor parameters, and make quick implementation changes. The panel includes an integrated display of the exposure and process settings, allowing for efficient and intuitive adjustments to optimize wafer production. Overall, SEMITOOL SSTF221280MBT is a highly advanced photoresist model that provides a reliable, efficient, and cost-effective solution for a variety of front-end semiconductor applications. With its integrated equipment design, powerful optics and processing capabilities, efficient cleaning regimen, and intuitive control panel, this system provides users with an enhanced level of control and throughput for their photolithography and wafer processing projects.
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