Used SEMITOOL SSTF221280MBT #293660319 for sale

SEMITOOL SSTF221280MBT is a photoresist equipment used in a variety of industries for the development of thin films over substrates. This system offers the most advanced photoresist technology, enabling a precise control of the film deposition and etching processes. The unit features a vertical spin chamber, which is utilized for the spinning of the substrate onto which the film will be photosensitively applied. The chamber holds the substrate for a predetermined period of time in order to ensure the uniform deposition and etching of the film. The chamber operates at a high spin rate (up to 22000 RPM), enabling the photoresist material to be applied in a uniform manner across the substrate. In addition, SEMITOOL SSTF-221-280MBT features a two stage exposed light source, an advanced thermal controller, and a chamber pressure monitoring machine. The two stage exposed light source, which includes an excimer laser and a mercury lamp, enables the photoresist material to be accurately applied without the creation of air bubbles. The chamber pressure monitoring tool further ensures the uniform deposition of the photoresist material, by monitoring and adjusting the chamber pressure to the desired levels. In addition to the advanced features, SST-F-221-280MBT also utilizes the latest in safety technology. This asset includes a fully integrated safety systems that allow the user to operate the model safely and efficiently. This includes enhanced safety features, such as an emergency stop switch, over temperature protection, and a safety interlock device. Overall, SSTF221280MBT is a high-end photoresist equipment that provides unmatched accuracy, precision, and safety in the development of thin films over substrates. With its advanced photoresist technology, the user is able to achieve an optimized photomask thickness, which results in superior film characteristics. This system is an ideal choice for any industrial production or laboratory setting where the development of thin films is necessary.