Used SEMITOOL ST 260 #293621582 for sale

SEMITOOL ST 260
Manufacturer
SEMITOOL
Model
ST 260
ID: 293621582
Spin Rinser Dryer (SRD) Type: Single stack.
SEMITOOL ST 260 is a photoresist equipment specifically designed for maskless lithography and lithography prototyping. This system enables users to quickly and efficiently produce photomasks and prototypes with high resolution and precision. The basic components of the unit include a radiation-resistant optical platform, a radiation source, a computer-controlled stage and a data input/output machine. The radiation-resistant optical platform is an electronically monitored and programmable tool, allowing users to accurately adjust the parameters of the optical beam and the position of the maskless lithography components. It also includes various optics, including a digital microscope, that enable high-resolution imaging of the maskless lithography layer. The radiation source is a Xenon arc lamp and a proprietary optical asset that focuses and collimates the light from the lamp. The computer-controlled stage is designed to precisely move components of the maskless lithography model along the x-axis, y-axis and z-axis, allowing for precise positioning and alignment of the components to the optical platform. The z-axis also allows for the height adjustment of the platform for precise focusing and imaging that are essential for high-resolution photomasks and lithography prototypes. The data input/output equipment is composed of user-friendly software and control console that enables users to program the maskless lithography process, upload mask data in different formats, control the exposure and pre- and post-processing operations. The system can also be controlled remotely through RS232/USB communications and can be integrated into higher-level test, measurement and automation systems. SEMITOOL ST-260 is a reliable, reliable and efficient photoresist unit that is ideal for maskless lithography and lithography prototyping. This machine provides high-resolution imaging, precise positioning, user-friendly software and complete tool integration, allowing users to quickly prototype high-quality photomasks and lithography designs.
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