Used SEMITOOL ST 260 #9170594 for sale

SEMITOOL ST 260 is a photoresist equipment used for the fabrication of highly complex microelectronic devices in the semiconductor industry. This versatile system consists of a rotating wafer stage, ultraviolet (UV) flood source and a laser projector which is used to expose a wafer surface with UV light. The stage is controlled by automated software and uses advanced techniques such as step-and-repeat to produce intricate patterns. SEMITOOL ST-260 utilizes a specialized laser diode projector, which produces a highly consistent beam profile that is ideal for creating minute details on the surface of a wafer. This projector can be programmed to display a range of shapes, sizes and patterns, and can be set to create a wide variety of photoresists with different levels of complexity. Additionally, the unit has the capability of coating the wafer with a thin layer of photoresist, a special material which is highly sensitive to UV light. After the photoresist has been applied, the laser projector can then be used to expose the surface of the wafer to the UV light in user-defined shapes and sizes. The UV light is produced by a finely tuned, long-wavelength-UV flood source which provides the energy necessary to "burn" the exposed areas of the photoresist. This process enables the user to create intricate patterns and shapes on the surface of the wafer which are then transferred to the underlying material through the photoresist etching process. This process is highly precise and accurate due to the software controlling the rotation and positioning of the wafer stage, ensuring that the exposure is consistent and reliable. ST 260 machine is a reliable and accurate tool capable of producing complex microelectronic devices. It is easy to operate and integrates well with process machinery, allowing for a seamless workflow. By utilizing the high precision laser diode projector and UV flood source, this tool is capable of producing intricate patterns with great accuracy. Additionally, its automated software greatly reduces the complexity of the photoresist etching process and ensures consistent and reliable results.