Used SEMITOOL ST 260 #9263895 for sale

SEMITOOL ST 260 is a photoresist equipment used in the semiconductor industry to perform versatile applications such as wafer cleaning, resist strip, and sputter cleaning. This system can support 2-inch or 4-inch wafers. It consists of four unit components: a wet processing cabinet, a chemical process cartridge, a rinse station, and a DI water machine. The wet processing cabinet is designed to reliably process wafers with deposition processes requiring a range of chemistries, temperatures and pressures. It features an efficient design for fast thermal control, as well as advanced safety features such as automatic vapor and flow rate monitoring. The cabinet's temperature range is between 5°C and 85°C, with a temperature uniformity of ±2°C. Chemical process cartridges allow users to process their wafers with a wide range of chemistries and temperatures. The rinse station allows high-precision wafer rinse and blend operations up to eight wafers simultaneously. The DI water tool consistently produces DI water quality for the most vital photoresist process controls. For photoresist removal, SEMITOOL ST-260 is designed with advanced resist strip technology. The asset can process up to 2- or 4-inch wafers. The process is done at 1310 nm or at shorter wavelengths for both diffusion and photoresist stripping. Strip rate and temperature are programmable for optimal results. Thermal ramp-up and ramp-down capabilities minimize temperature overshoot. For photoresist application, the model is also designed with advanced sputter clean technology. This process can remove chemical and particle residues from wafer surfaces prior to resist coating. The temperature range for sputter cleaning is up to 215°C with a clean time up to 45 minutes. ST 260 is a reliable photoresist processing equipment for a variety of demanding nanotechnology applications. The system's advanced features enable users to consistently produce high-quality results, while its ease of use makes it suitable for any industrial process line.