Used SEMITOOL ST 260D #9208974 for sale

Manufacturer
SEMITOOL
Model
ST 260D
ID: 9208974
Spin rinse dryer.
SEMITOOL ST 260D photoresist equipment is a system used for precision patterning of microelectronic components and other delicate devices. It is designed for lithography processes that require the highest levels of accuracy and speed. The unit is designed to offer superior performance and reliability in the demanding environment of the semiconductor and electronics industry. SEMITOOL ST-260D photoresist machine uses state-of-the-art imaging and optics technology to provide superior print quality and feature resolution. It offers advanced variable-diameter and high-density patterning capabilities that are ideal for the development of the most intricate chip designs. The tool also provides enhanced accuracy and throughput even at very high line widths and dense patterns. The asset is powered by an advanced controller and working stations, allowing for quick and easy setup and operation. The controller is designed to streamline the entire photolithography process, from recipe setup to alignment and masking. It features an automated wafer-level, high-definition, multi-station optimization model with sophisticated, dynamic data-driven calculations and controls. ST 260 D photoresist equipment offers a wide range of features that enable a high level of control and flexibility. These include variable laser power, 120μm laser focusing capabilities, high-resolution data capture, and accurate resist-masking capabilities. The system is also capable of managing dynamic and intensive screen printing and alkaline developing processes, enabling the highest level of accuracy and precision. ST 260D photoresist unit can be configured with a comprehensive range of accessories and options. These include an automated vision alignment machine, a motorized stepper Z-axis, and a continuous flow and wash station for processing temperature-sensitive substrates. ST-260D photoresist tool provides a reliable and dependable solution for high-end lithography and patterning requirements. It is designed for advanced Patterning applications in mission-critical industries such as semiconductor and electronics design and fabrication, and is an ideal choice for applications that require extremely accurate and repeatable results.
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