Used SEMITOOL ST 270D #9166872 for sale

Manufacturer
SEMITOOL
Model
ST 270D
ID: 9166872
Wafer Size: 5
Spin rinser / dryer, 5" Dual stack (1) Rotor Not included: Controllers Monitors.
SEMITOOL ST 270D is an automated photoresist equipment designed for semiconductor production. It is an advanced piece of equipment that provides operators with the ability to pattern wafers with photoresist and other etching materials quickly and accurately. This system has a fully automated, self-contained design to provide efficient and reproducible photoresist processing of all different types of substrates. The unit consists of four modules arranged in a modular format - the clean, developer, rinse and cure modules. It is equipped with a patented, self-adjusting, modular electro-mechanical platform and submerge arm, allowing the machine to handle various wafer sizes and styles. In addition, ST 270D has a fully automated dispensing and photo-resist application tool that can coat up to 250 wafers per hour. The asset can process both positive and negative photoresists, allowing it to etch both thick and thin layers of deposition. SEMITOOL ST 270D also features an adjustable pressure purge nozzle to remove any unwanted contaminants, as well as a uniform resist spray model that maintains consistent coat density. The equipment has up to five independent computer controllers that can be programmed with custom recipes, including dispense rate, curing parameters and process step timing. It is capable of controlling the temperature, humidity and oxygen levels inside the tool to ensure consistent results. The system has an automated track-feeding feature and is compatible with a broad range of substrate sites and magazines. In addition, ST 270D includes an imaging unit to enable operators to verify process accuracy and debug issues. Overall, SEMITOOL ST 270D is an advanced piece of equipment used for photoresist production in the semiconductor industry. Its fully automated, self-contained design ensures efficient and reproducible photoresist processing with its adjustable pressure purge, uniform resist spray, temperature and humidity control and imaging machine functionalities.
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