Used SEMITOOL ST 270D #9246163 for sale

SEMITOOL ST 270D is a Photoresist equipment which is designed to provide the highest level of precision in wafer photomask processing. This system is a 6-axis unit, with the ability to position and move various substrates within a range of three-dimensional axial positions. It has a top-loading wafer cassette capacity of up to 50 wafers, and can support wafer diameters between 100 to 200 mm. The machine is also equipped with an array of plasma sources that support surface activation, ashing, and etching. ST 270D is able to perform photolithography steps, which include coating, exposing, and developing. It supports a variety of photoresists, including positive, negative, and dual- tone resists, and can operate with a variety of wavelengths, such as dry, deep UV (wavelengths between 365 or 375 nanometers), and I-line (wavelengths between 365 or 410 nanometers). In addition, the tool also supports the spin-on deposition, mask evaporation, and advanced dry etch methods. The asset is capable of controllably ion-cleaning and neutrally ashing Wafers, in order to ensure that the photoresist is completely free of contaminants before exposure. It also has an advanced energy deposition control (EDC) that offers uniform oxide etching and an array of plasma sources to support etching, oxidation, and deposition. Moreover, it has a high-precision motion model, capable of accurately positioning photomasks and wafers to a range of sizes, enabling precise patterning. SEMITOOL ST 270D equipment also features an integrated OPC workstation, in which users can conduct rule-based design optimization for minimizing lithographic errors and improving printability. This system is further equipped with the MaskEdit software, which is designed to provide optimal exposure-modulation control. Lastly, the unit provides advanced yield analysis tools which can be used to identify, quantify, and rectify lithography-relevant process-variables from a wide range of sources.