Used SEMITOOL ST 280 #9160074 for sale

SEMITOOL ST 280 is a photoresist equipment designed for the use in semiconductor manufacture. It is engineered for applications in both wafer plasma-etch and wet chemical process chambers. The system provides multi-step cycle capabilities with precise temperature control, high uniformity, and optimal process control. This model is particularly useful in production line processing of 75-200 µm substrates in mainstream CMOS and for MEMS technology. ST 280 is driven by a powerful programmable logic controller (PLC) and equipped with a high-temperature, multi-point resistance temperature detector (RTD) array for rapid ramping and cooling of process chambers. Utilizing efficient, high-performance metering vapor delivery and inert gas control systems, the unit's precision-machined components comprise a reliable and essential part of the production process. The machine features a four-point substrate holder sensor array with an integrated camera for precise and repeatable substrate alignment in the chamber. The highly-modular scrubber and clean-up tool maintains an ideal snubber interface, further increasing the asset's reliability. For optimal substrate processing, SEMITOOL ST 280 uses an industry-standard chamber design. The x, y, and temperature zones produce excellent uniformity, and the lateral center-to-edge uniformity of the wafer is typically better than 0.25°C. The pivoting ring provides an additional 0.25°C uniformity variation in the z-direction. The gas mixing capabilities of the model make it possible to create custom gas pressure and flow profiles. This, along with a wide variety of substrate materials, enables the equipment to be utilized for a wide range of etching and deposition processes. ST 280 supports wafer temperature control from room temperature to 400°C with 6°C of stability. The high thermal uniformity enables manufacturers to reduce process windows and achieve process repeatability and unmatched productivity, lower process temperatures, and higher yields. The system supports a variety of production-level photoresist thicknesses. In addition, the unit uses an industry-standard 4-tier motorized chuck lift, eliminating the need for further chucking modifications, as well as a universal chuck plate, a brilliant feature that eliminates the need for process-specific fixtures. In summary, SEMITOOL ST 280 is a reliable and efficient machine that provides superior accuracy and repeatability for photoresist processes in both wafer plasma-etch and wet chemical process chambers. The tool can run a wide variety of processes and is well suited to production line processing of 75-200 µm substrates. It offers superior control, temperature uniformity, and process repeatability that produce cost-saving and yields.