Used SEMITOOL ST 440 #9194043 for sale

SEMITOOL ST 440 is a photoresist equipment designed for use in semiconductor processing. This system is capable of applying a resist layer to numerous substrates, including silicon, silicon germanium, gallium nitride, and aluminum gallium arsenide. ST 440 has a versatile platform that provides a wide range of exposure and development options, including direct projection (DP), contact aligner (CA), and image reversal (IR). The versatility of the unit makes it suitable for most production photolithography processes. SEMITOOL ST 440 is equipped with a load-lock chamber for loading and unloading of substrates. It features a six-axis robotic arm to facilitate motion of the wafer from an entrance load and unload station to the processing chamber. The arm can even clean the wafer after it has been transferred to the processing chamber. Additionally, a mechanical arm is present to ensure accurate and precise substrate handling. The photoresist machine has a digital pattern generator which can generate a vast array of shapes and line densities across the resist layer. The pattern generator can be accessed with either a 2-D or 3-D image. The tool is also equipped with a laser source for imaging and alignment. The laser source features a wavelength of 400 - 430 nm and a resolution of 5 microns. ST 440 utilizes an illumination asset that can select between light emitting diode (LED) mode for low-power applications and floodlight mode for high-power applications. This illuminating model is coupled with a precision stage that is manually adjusted to provide precise positioning of the resist layer for exposure. The stage is designed with a joystick handle and an encoder to ensure maximum accuracy. The equipment contains a three-stage develop chamber, which allows for solvent vapor development, wet process development, and rinse after development. This eliminate the need for transfer or sample delidding before the postprocess. The temperature of the hot plate in the chamber is controlled via a PID process that has an accuracy of +/-1 degree Celsius. The developed pattern can be measured and inspected with a telecentric microscope. SEMITOOL ST 440 can handle a various substrates and thicknesses up to 200-microns thick. It is capable of a fast and repeatable production process for integrated circuit (IC) processing. This system is equipped with a user interface that allows for easy adjustment of the settings and parameters to meet specific requirements. It is also designed with safety features to ensure the safety of the user, substrate, and equipment.