Used SEMITOOL STI 860 #9012259 for sale

Manufacturer
SEMITOOL
Model
STI 860
ID: 9012259
Wafer Size: 4"-5"
Spin rinse dryer (SRD), 4"-5" Dual chamber Crated.
SEMITOOL STI 860 Photoresist Equipment is a powerful, reliable and highly advanced machine designed to meet the needs of the modern semiconductor industry. This system offers excellent uniformity and repeatability in both manual and automated wafer processing applications. The unit is designed to be used for all types of photolithography processes, including resist spin coating, post-exposure bake, develop, and etch steps. STI 860 has built in controls for handling of substrates such as wafers, masks, and pods. SEMITOOL STI 860 machine has a six-station turret design, providing excellent accessibility for loading and unloading substrates through its front and back sides. The chamber design of STI 860 is also very efficient in providing uniform flow of cross-linked resist across the entire wafer surface. The precursor delivery tool, with its mechanical arm and flow distribution asset, ensures precise and even distribution of the photoresist during the spin application process. An advanced Resist Spin Dryer model is also included in SEMITOOL STI 860 equipment, ensuring uniform drying and exclusion of damaging ambient contaminants. The precision load plate design enables accurate positioning of the wafer during the spin coating process and allows for uniform resist thickness and uniformity. The durability of the machine is improved with the inclusion of heavy-duty motors, which provide precise fluid motion control. STI 860 is also equipped with a large viewing window composed of insulated glass, allowing the user to better monitor the progress of the process inside. Additionally, the automated control system is incredibly user friendly and straightforward to operate. SEMITOOL STI 860 is an excellent choice for the semiconductor industry, thanks to its high performance, reliability, and automation. The highly advanced unit offers an efficient solution for a wide range of photolithography needs and can be easily integrated into most modern semiconductor manufacturing processes. STI 860 is also an excellent choice for wafer fabrication and resist processing, providing accurate, repeatable and uniform results.
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