Used SEMITOOL / VERSATILE TECHNOLOGIES ST-870 #9265365 for sale

SEMITOOL / VERSATILE TECHNOLOGIES ST-870
ID: 9265365
Wafer Size: 6"
Spin Rinse Dryer (SRD), 6".
SEMITOOL / VERSATILE TECHNOLOGIES ST-870 is a photoresist equipment designed for high-volume production of multi-level, MEMS, MCM, and other advanced semiconductor devices. The system features a high-efficiency laminar-flow process specification for both liquid and vapor-phase processing. This allows for precise film coverage and processto-process repeatability. Additionally, SEMITOOL ST-870 features a multi-zone RF bias platen. This platen provides rapid thermal processing which allows for reliable and repeatable processes while meeting stringent processing demands. The unit is equipped with an integrated data management machine which allows for quick and easy data tracking and reporting. VERSATILE TECHNOLOGIES ST-870 has a variety of process chambers, including pre-clean chambers, resist strip chambers, solvent-stripping chambers, and spin-coater chambers. This allows the tool to handle a wide range of photoresist applications. The asset also has an in-situ metrology chamber which enables layer thickness measurements, layer profile measurements, and general inspection for defect analysis. The model utilizes globally-controlled computer networks for process controls and data analysis. This provides for sophisticated process control and analysis capabilities. The user-friendly touchscreen interface provides ease of operation and configuration. ST-870 has an overall thermal flow profile of up to 900°C, making it suitable for a wide range of materials. The equipment is also available with a range of custom features, including a process data tracking system, multi-zone heating platen, and automated management of wafers and carriers. In summary, SEMITOOL / VERSATILE TECHNOLOGIES ST-870 is an advanced photoresist unit designed for production of multi-level, MEMS, MCM, and other advanced semiconductor devices. It features high-efficiency laminar-flow processing and a variety of process chambers, including pre-clean chambers, resist strip chambers, spin-coater chambers, and an in-situ metrology chamber. The machine is equipped with networked computer controls for process control and data analysis. Additionally, the tool offers a range of custom features, including a process data tracking asset, multi-zone heating platen, and automated management of wafers and carriers.
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