Used SEMITOOL WSST-408A #9401359 for sale

SEMITOOL WSST-408A Photoresist Equipment is a fully automated, single-wafer wet strip system. This unit is designed to strip photoresist from single wafers in a controlled atmosphere, using programmable and process-controlled stripping solutions. The machine can handle up to 400mm wafers in sizes including 8,12,or 15 inch (200,300,or 350mm). The tool includes a storage tank, which holds 40 liters of stripping solution and a temperature-controlled metering pump, with four channels and five stirring magnets. Chemical dosing is precisely controlled with a digital pump controller, while a programmable controller manages the program steps. The stainless-steel reaction chamber is equipped with four concentrating bulkheads and a P21 air circulation asset, along with a UV/ ozone lamp and gas injection systems. An automated wafer-handling model transports wafers into and out of the reaction chamber. The equipment also features a TurboX Vacuum Pump for automated liquid and gas exhaust. WSST-408A can strip photoresist with a variety of solutions, such as hydrochloric acid, sulfuric acid, ammonium hydroxide, potassium persulfate, and hydrogen peroxide. It is also capable of stripping wafers at temperatures up to 60°C, allowing for a higher degree of wafer surface cleanliness and greater ability to strip more difficult resists. The end result is higher uniformity, increased yields, and greater throughput. The system is designed for process flexibility, with a simple software user interface, enabling operators to adjust parameters for changing process conditions. The wide range of features offered by SEMITOOL WSST-408A Unit make it an ideal choice for high-yield photoresist stripping processes.