Used SEMITOOL WSST #9400944 for sale

SEMITOOL WSST is a photoresist equipment designed and manufactured by SEMITOOL inc. and released in 2000. It is an automated submicron photolithography system with a choice of variety of photoresists and features. This unit is structured with a programmable scanner which is capable to hold up to 28 substrates of 12-inch and 6 systems with two times the speed of SEMITOOL previous photoresist platform the WFST. The machine covers a spectrum of applications from wafer cleaning, to wet / dry etching, and to photoresist strip. The anisotropic plasma etch provides a high layer selectivity and the advanced 3D suspension technology can enable uniform film thickness even with concave or non-planar substrates. WSST is optimized for back end of line processes like contact mask repair, multi layer insulation etching and backside direct imaging. It supports adding extra performance in addition to the high standard of reliability that SEMITOOL provides. Its components are completely air-bearing closed mechanics, which offers minimal vibrations, to ensure a balanced thermal environment, efficiant operation and exceptional reliability. In addition, SEMITOOL includes an integrated options like high current photoresist applications and a unique high definition scanning capability. It can accommodate a range of different solutions as well like an additional Track Out/Track In (T/T) Tool for single substrate production and an optional Transactional Product Lane (TPL) for integrated compensation of bow, warpage and global temperature drifts. Furthermore, SEMITOOL WSST is designed to be used in a Class I cleanroom environment, with a 135 degree C max temperature and a maximum photoresist thickness of 3500 angstroms. Its size is integrated with automated process materials, computer control, and a secure front to back compact design, which is installed with a standard 25' long load lock and a dust-free nitrogen environment to ensure pristine cleanliness. WSST photoresist asset provides the ability to process its full range of photoresist products, contact masks, and MOEMS without human intervention. It offers a variety of features to meet specific process requirements with less overhead. The features and range of applications makes it an ideal choice for any submicron lithography process.